Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Pedro Herrera; Kun Gao; Chen Dror; Eitan Hajaj; Alon Alexander Volfman; Raviv Yohanan; Vidya Ramanathan; Victoria Naipak; Renan Milo; Tal Yaziv; Nir BenDavid; Meng Wang; Hao Mei; Weihua Li; Xindong Gao; Dongyue Yang; Cheuk Wun Wong; Karsten Gutjahr; Xueli Hao; Tony Joung; Md. Motasim Bellah; DeNeil Park; Yue Zhou; Abhishek Gottipati

doi:10.1117/12.2514725

26 March 2019 Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, Abhishek Gottipati

Author Affiliations +

Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 1095928 (2019) https://doi.org/10.1117/12.2514725
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

As semiconductor technology nodes keep shrinking, ever-tightening on-product overlay (OPO) budgets coupled with continuous process development and improvement make it critical to have a robust and accurate metrology setup. Process monitoring and control is becoming increasingly important to achieve high yield production. In recently introduced advanced overlay (OVL) systems, a supercontinuum laser source is applied to facilitate the collection of overlay spectra to increase measurement stability. In this paper, an analysis methodology has been proposed to couple the measured overlay spectra with overlay simulation to extract exact process information from overlay spectra. This paper demonstrates the ability to use overlay spectra to capture and quantify process variation, which in turn can be used to calibrate the simulation stacks used to create the SCOL (scatterometry-based overlay) and AIM overlay metrology targets, and can be fed into the fab for process monitoring and improvement.

Citation Download Citation

Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, and Abhishek Gottipati "Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 1095928 (26 March 2019); https://doi.org/10.1117/12.2514725

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