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25 June 2019 Machine learning for predictive electrical performance using OCD (Erratum)
Sayantan Das, Joey Hung, Sandip Halder, Guillaume Schelcher, Roy Koret, Igor Turovets, Mohamed Saib, Anne-Laure Charley, Matthew J. Sendelbach, Avron Ger, Philippe Leray
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Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 1095932 (2019) https://doi.org/10.1117/12.2541616
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States
Abstract
This paper, originally published on 26 March 2019, was replaced with a corrected/revised version on 25 June 2019. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance.
Das, Hung, Halder, Koret, Turovets, Saib, Charley, Sendelbach, Ger, and Leray: Machine learning for predictive electrical performance using OCD (Erratum)
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Sayantan Das, Joey Hung, Sandip Halder, Guillaume Schelcher, Roy Koret, Igor Turovets, Mohamed Saib, Anne-Laure Charley, Matthew J. Sendelbach, Avron Ger, and Philippe Leray "Machine learning for predictive electrical performance using OCD (Erratum)", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 1095932 (25 June 2019); https://doi.org/10.1117/12.2541616
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KEYWORDS
Machine learning
Capacitance
Inspection
Metrology
Optical lithography
Process control
Lithography
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