Reactive ion beam etching-based planarization of optical aluminium surfaces

Melanie Ulitschka; Jens Bauer; Frank Frost; Thomas Arnold

doi:10.1117/12.2513670

26 April 2019 Reactive ion beam etching-based planarization of optical aluminium surfaces

Melanie Ulitschka, Jens Bauer, Frank Frost, Thomas Arnold

Proceedings Volume 11032, EUV and X-ray Optics: Synergy between Laboratory and Space VI; 110320D (2019) https://doi.org/10.1117/12.2513670
Event: SPIE Optics + Optoelectronics, 2019, Prague, Czech Republic

Abstract

The surface error topography of optical aluminium surfaces after common manufacturing by single-point diamond turning meets the requirements for applications in the infrared spectral range. However, for short-wavelength applications in the (E)UV spectral range the requirements in the optical surface quality increase immensely. Reactive ion beam etching (RIBE) is a promising process route, which allows direct surface machining rather than the use of a NiP coating. Lowenergy ion beams driven by a reactive process control permit a roughness preservation up to 1 μm etching depth. The effect of RIBE machining on roughness features is evaluated suggesting a model scheme for smoothing of high-frequency features.

Citation Download Citation

Melanie Ulitschka, Jens Bauer, Frank Frost, and Thomas Arnold "Reactive ion beam etching-based planarization of optical aluminium surfaces", Proc. SPIE 11032, EUV and X-ray Optics: Synergy between Laboratory and Space VI, 110320D (26 April 2019); https://doi.org/10.1117/12.2513670

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