Presentation
14 May 2019 Status and perspective on the SACLA facility (Conference Presentation)
Author Affiliations +
Abstract
SPring-8 Angstrom Compact free-electron LAser (SACLA) at SPring-8, Japan [1,2] was inaugurated in March, 2012 as the first compact XFEL facility that combines a low-emittance electron-beam injector, a high-gradient C-band linac, and short-period in-vacuum undulators. SACLA generates intense short-wavelength XFEL radiation below 1 Å with a moderate electron beam energy of 8 GeV. To extend capabilities, state-of-the-art X-ray optic, detectors, and experimental instruments have been continu-ously developed. To further increase an intensity of XFEL pulses, we have developed a 1-um focusing optics [3] and a 50-nm focusing optics based on a two-stage scheme [4], by using state-of-the-art reflective mirrors in a collaboration with Osaka University. A significant intensity of 10^20 W/cm2 generated by the tight fo-cusing system has enabled unique opportunities for conducting non-linear X-ray sciences, for example, atomic K-alpha lasers excited with XFEL pulses [5], two-photon X-ray absorption [6], and X-ray-pump & X-ray-probe studies to investigate ultrafast damage processes induced by intense X-rays [7]. In this talk, I will review the status [8] and future perspective of the complex facilities SACLA and SPring-8. References [1] T. Ishikawa et al., Nature Photon., 6, 540 (2012). [2] M. Yabashi et al., J. Synchrotron Rad., 22, 477 (2015). [3] K. Yumoto et al., Nature Photon., 7, 43 (2013). [4] H. Mimura et al., Nature Commun., 5, 3539 (2014). [5] H. Yoneda et al., Nature, 524, 446-449 (2015). [6] K. Tamasaku et al., Nature Photon. 8, 313 (2014). [7] I. Inoue et al., Proc. Natl. Acad. Sci. USA. 113, 1492 (2016). [8] http://xfel.riken.jp/research/indexnn.html
Conference Presentation
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Makina Yabashi "Status and perspective on the SACLA facility (Conference Presentation)", Proc. SPIE 11035, Optics Damage and Materials Processing by EUV/X-ray Radiation VII, 1103502 (14 May 2019); https://doi.org/10.1117/12.2523624
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Cited by 1 scholarly publication.
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KEYWORDS
X-rays

Absorption

Electron beams

Free electron lasers

Mirrors

Reflectivity

Sensors

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