Polarization metrology for high numerical aperture DUV objectives

Robert D. Grejda; Paul F. Michaloski; Duncan C. Spaulding; Stephen K. Mack; Robert L. Michaels; Paul G. Dewa; David L. Aronstein

doi:10.1117/12.2525606

21 June 2019 Polarization metrology for high numerical aperture DUV objectives

Robert D. Grejda, Paul F. Michaloski, Duncan C. Spaulding, Stephen K. Mack, Robert L. Michaels, Paul G. Dewa, David L. Aronstein

Author Affiliations +

Proceedings Volume 11057, Modeling Aspects in Optical Metrology VII; 110570P (2019) https://doi.org/10.1117/12.2525606
Event: SPIE Optical Metrology, 2019, Munich, Germany

Abstract

This paper describes an instrument and method for high-resolution characterization of lens components and assemblies for DUV retardance performance at various stages of manufacture. The instrument is a bespoke rotating analyzer Stokes polarimeter designed for DUV wavelengths (e.g. 193 nm, 213 nm, 266 nm, etc.). Using a laser source, the polarimeter delivers a small diameter beam with a characterized polarization state to the optical lens element or objective assembly at the “as-used” design angles of incidence (AOI) to characterize the retardance through the lens or objective at an arbitrary location. The polarization characteristics are usually described by the retardance at specific locations on a component or sub-assembly that can be used to characterize components during development and manufacturing or optimize performance of an assembly.

Citation Download Citation

Robert D. Grejda, Paul F. Michaloski, Duncan C. Spaulding, Stephen K. Mack, Robert L. Michaels, Paul G. Dewa, and David L. Aronstein "Polarization metrology for high numerical aperture DUV objectives", Proc. SPIE 11057, Modeling Aspects in Optical Metrology VII, 110570P (21 June 2019); https://doi.org/10.1117/12.2525606

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