Paper
10 May 2019 Influence mechanism of plasma cleaning and ion beam figuring on the intrinsic surface of fused silica
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Proceedings Volume 11068, Second Symposium on Novel Technology of X-Ray Imaging; 110681G (2019) https://doi.org/10.1117/12.2524520
Event: Second Symposium on Novel Technology of X-Ray Imaging, 2018, Hefei, China
Abstract
The laser damage threshold of fused silica optics is affected by the surface/subsurface defects in optical fabrication and is related to surface contamination. In this paper, the evolution of surface roughness and photothermal weak absorption of fused silica treated by plasma cleaning and ion beam figuring (IBF) is studied. The results show that plasma cleaning has a certain change on the surface roughness of fused silica, while the change of photothermal weak absorption depends on the initial surface quality. The surface roughness of fused silica has a certain regularity after ion beam figuring, and the photothermal weak absorption is basically consistent with the initial.
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Kun Zhang, Feng Shi, Lin Zhou, Wanli Zhang, and Yifan Dai "Influence mechanism of plasma cleaning and ion beam figuring on the intrinsic surface of fused silica", Proc. SPIE 11068, Second Symposium on Novel Technology of X-Ray Imaging, 110681G (10 May 2019); https://doi.org/10.1117/12.2524520
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KEYWORDS
Plasma

Silica

Surface roughness

Absorption

Ion beams

Ion beam finishing

Ions

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