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10 May 2019 An investigation on the material removal mechanism of abrasive-free jet polishing for KDP crystal
Wei Gao, Pengfei Sun, Lili Wang, Min Xu, Chao Wang, Fang Ji
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Proceedings Volume 11068, Second Symposium on Novel Technology of X-Ray Imaging; 110681W (2019) https://doi.org/10.1117/12.2524639
Event: Second Symposium on Novel Technology of X-Ray Imaging, 2018, Hefei, China
Abstract
Potassium dihydrogen phosphate (KDP) is the irreplaceable nonlinear single crystal as optical frequency conversion and electro-optical switch in inertial confinement fusion (ICF) laser system. Based on the water solubility characteristics of KDP crystal, we propose an abrasive-free jet polishing (AFJP) method for KDP crystal with the purpose of improving surface quality without the embedding of particles. According to the AFJP experimental results, the jet spot generated by AFJP is of an approximately Gaussian shape. The feasibility of this approach has been studied through spot experiments. And the material removal mechanisms can be divided into contact removal and slipping removal.
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Wei Gao, Pengfei Sun, Lili Wang, Min Xu, Chao Wang, and Fang Ji "An investigation on the material removal mechanism of abrasive-free jet polishing for KDP crystal", Proc. SPIE 11068, Second Symposium on Novel Technology of X-Ray Imaging, 110681W (10 May 2019); https://doi.org/10.1117/12.2524639
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KEYWORDS
Crystals
Polishing
Nonlinear crystals
Surface finishing
Laser crystals
Optics manufacturing
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