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30 August 2019 Tailored multiphoton polymerization for functional microstructures
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Abstract
In this presentation we discuss our attempts at balancing the desirable, and often mutually exclusive properties of resolution and mechanical stability with radical polymerizable photoresists in two-photon lithography (TPL). The photopolymerization dynamics at and around voxels (volume pixels) were controlled by the combined action of a co-initiator and a radical quencher added into the photoresist. In the second part of the manuscript longitudinal scanning during microfabrication is studied as a method to achieve fast fabrication of hierarchical microstructures with hexahedral unit cells.
Conference Presentation
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Prem Prabhakaran, Cheol Woo Ha, Kwang-Sup Lee, and Xiangming Cheng "Tailored multiphoton polymerization for functional microstructures", Proc. SPIE 11098, Molecular and Nano Machines II, 110980M (30 August 2019); https://doi.org/10.1117/12.2529977
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