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10 September 2019 Initial polishing machine control model to determine target TIF depth on SiC mirror surfaces (Conference Presentation)
Jeong-Yeol Han, Suyeon Cha, Dohoon Kim, Myung Cho
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Proceedings Volume 11101, Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems IV; 111010A (2019) https://doi.org/10.1117/12.2529836
Event: SPIE Optical Engineering + Applications, 2019, San Diego, California, United States
Abstract
Due to the high toughness of SiC material, in general, the polishing time of a SiC mirror has been challenging to determine by optician. In the optical shop, optician normally enters input parameters into a polishing machine prior to polish out the mirror surface. The target surface removal rate, specified by an optician, are highly depending on polishing schedule. A very tight polishing schedule commonly thrusts adventurous larger target quantities on the optician. However, the target numbers should be determined by the reliability of relationships between the machine input parameter and output removal rate. In this paper, we introduce an initial model which can reliably suggest machine input parameters for polishing head. These parameters can control polishing processes to achieve the target TIF (Tool Influence Function) depth which is an unit polishing removal quantity on the SiC mirror optical surfaces.
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Jeong-Yeol Han, Suyeon Cha, Dohoon Kim, and Myung Cho "Initial polishing machine control model to determine target TIF depth on SiC mirror surfaces (Conference Presentation)", Proc. SPIE 11101, Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems IV, 111010A (10 September 2019); https://doi.org/10.1117/12.2529836
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KEYWORDS
Mirrors
Polishing
Silicon carbide
Surface finishing
Polishing equipment
Process control
Head
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