Heat accumulation effect existing in silicon substrate by femtosecond laser irradiation on antireflection performance

Tong Chen; Wenjun Wang; Tao Tao; Xuesong Mei; Aifei Pan

doi:10.1117/12.2528299

30 August 2019 Heat accumulation effect existing in silicon substrate by femtosecond laser irradiation on antireflection performance

Tong Chen, Wenjun Wang, Tao Tao, Xuesong Mei, Aifei Pan

Author Affiliations +

Proceedings Volume 11101, Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems IV; 111010C (2019) https://doi.org/10.1117/12.2528299
Event: SPIE Optical Engineering + Applications, 2019, San Diego, California, United States

Abstract

Reducing the reflection of silicon surface is an effective way to enhance its optical absorption performance in optical and optoelectronic devices. In this paper, the influence mechanism of heat accumulation effect existing in the material substrate on the multi-scale porosity properties of surface structure during femtosecond laser irradiation is investigated. Micro-nano structures will lose their multi-scale porous properties at high-repetition-rate laser irradiation due to excessive agglomeration, nucleation or melting. By rapidly cooling the material substrate, the porosity of surface micro-nano structure are optimized, and the antireflection performance of the material surface is improved obviously. Our study opens a novel and convenient route for preparation of broadband antireflective black silicon surfaces for various applications.

Citation Download Citation

Tong Chen, Wenjun Wang, Tao Tao, Xuesong Mei, and Aifei Pan "Heat accumulation effect existing in silicon substrate by femtosecond laser irradiation on antireflection performance", Proc. SPIE 11101, Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems IV, 111010C (30 August 2019); https://doi.org/10.1117/12.2528299

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