Beam size measurement for XFEL nanobeam using intensity interferometer of x-ray fluorescence (Conference Presentation)

Nami Nakamura; Satoshi Matsuyama; Takato Inoue; Ichiro Inoue; Taito Osaka; Yuichi Inubushi; Makina Yabashi; Tetsuya Ishikawa; Kazuto Yamauchi

doi:10.1117/12.2532283

9 September 2019 Beam size measurement for XFEL nanobeam using intensity interferometer of x-ray fluorescence (Conference Presentation)

Nami Nakamura, Satoshi Matsuyama, Takato Inoue, Ichiro Inoue, Taito Osaka, Yuichi Inubushi, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Author Affiliations +

Proceedings Volume 11109, Advances in Metrology for X-Ray and EUV Optics VIII; 111090L (2019) https://doi.org/10.1117/12.2532283
Event: SPIE Optical Engineering + Applications, 2019, San Diego, California, United States

Abstract

Tight XFEL focusing is very important for significantly enhancing photon flux density, which is highly demanded by users exploring nonlinear X-ray optics. However, focusing XFEL down to 10 nm or less is so difficult from the viewpoints of both optical fabrication and optical alignment. The former can be overcome using techniques of wavefront sensing and fine shape correction. For the latter, techniques for directly measuring beam size on the focus without an influence of vibration of nanobeam are required. We have developed a technique for determining the size of nanobeam on the focus using an intensity interferometer, based on the Hanbury Brown and Twiss effect, of X-ray fluorescence emitted from a thin film inserted into the focus. The spatial coherence of X-ray fluorescence observed far from the focus depends on the distance from the focus and emission region of X-ray fluorescence. Therefore, the measured coherence can determine the size of X-ray nanobeam. This method has advantages that vibration of nanobeam does not affect the result and the setup is so simple. A demonstration experiment was performed using a 100 nm focusing system based on total reflection KB mirrors at SACLA. X-ray fluorescence (8 keV) emitted from a thin Cu film by irradiation of focused XFEL pulses (12 keV) was detected shot-by-shot with a dual MPCCD. Analyses of approximately 1000 images based on the autocorrelation revealed that the beam size obtained with this method is in good agreement with one obtained with the wire scan method.

Conference Presentation

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Nami Nakamura, Satoshi Matsuyama, Takato Inoue, Ichiro Inoue, Taito Osaka, Yuichi Inubushi, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi "Beam size measurement for XFEL nanobeam using intensity interferometer of x-ray fluorescence (Conference Presentation)", Proc. SPIE 11109, Advances in Metrology for X-Ray and EUV Optics VIII, 111090L (9 September 2019); https://doi.org/10.1117/12.2532283

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KEYWORDS

X-ray fluorescence spectroscopy

Interferometers

Optical testing

Thin films

Nonlinear optics

Optical alignment

Optical fabrication

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