Particle on EUV pellicles, impact on LWR

Michiel Kupers; Gijsbert Rispens; Lokesh Devaraj; Gerardo Bottiglieri; Twan van den Hoogenhoff; Par Broman; Andreas Erdmann; Felix Wahlisch

doi:10.1117/12.2537103

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9 October 2019 Particle on EUV pellicles, impact on LWR

Michiel Kupers, Gijsbert Rispens, Lokesh Devaraj, Gerardo Bottiglieri, Twan van den Hoogenhoff, Par Broman, Andreas Erdmann, Felix Wahlisch

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Proceedings Volume 11147, International Conference on Extreme Ultraviolet Lithography 2019; 111470S (2019) https://doi.org/10.1117/12.2537103
Event: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States

Abstract

The EUV pellicle is a thin membrane intended to shield the reticle from particles. Any particles on the pellicle will be out of focus but large particles can still locally influence pattern formation. This work experimentally determines the local imaging influence dependence of particle size. A predictive model for CD change was formulated and validated. Furthermore, a linear relation between the change of CD vs. LWR was derived and found to be driven by the resist only. Therefore, the CD and LWR influence from a particle can be predicted, enabling meaningful specification limits for particle size from an imaging perspective.

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Michiel Kupers, Gijsbert Rispens, Lokesh Devaraj, Gerardo Bottiglieri, Twan van den Hoogenhoff, Par Broman, Andreas Erdmann, and Felix Wahlisch "Particle on EUV pellicles, impact on LWR", Proc. SPIE 11147, International Conference on Extreme Ultraviolet Lithography 2019, 111470S (9 October 2019); https://doi.org/10.1117/12.2537103

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