Laboratory-based EUV spectroscopy for the characterization of thin films, membranes and nanostructured surfaces

Lukas Bahrenberg; Sven Glabisch; Moein Ghafoori; Sascha Brose; Serhiy Danylyuk; Jochen Stollenwerk; Peter Loosen

doi:10.1117/12.2536884

26 September 2019 Laboratory-based EUV spectroscopy for the characterization of thin films, membranes and nanostructured surfaces

Lukas Bahrenberg, Sven Glabisch, Moein Ghafoori, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Peter Loosen

Author Affiliations +

Proceedings Volume 11147, International Conference on Extreme Ultraviolet Lithography 2019; 111471X (2019) https://doi.org/10.1117/12.2536884
Event: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States

Abstract

The authors present studies on laboratory-based spectroscopy in the extreme ultraviolet (EUV) performed on a variety of thin film materials. This work focuses on spectroscopic measurements of EUV reflectivity and transmittance at wavelengths between 10 nm and 15 nm. The presented applications of the technique include the reconstruction of optical constants for novel materials such as EUV photoresists and absorbers, the characterization of EUV pellicles and ultrathin layer systems as well as the characterization of nanostructured surfaces.

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Lukas Bahrenberg, Sven Glabisch, Moein Ghafoori, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, and Peter Loosen "Laboratory-based EUV spectroscopy for the characterization of thin films, membranes and nanostructured surfaces", Proc. SPIE 11147, International Conference on Extreme Ultraviolet Lithography 2019, 111471X (26 September 2019); https://doi.org/10.1117/12.2536884

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