EUV reticle defectivity protection options

Michael Lercel; Christophe Smeets; Mark van de Kerkhof; Amo Chen; Tjarko van Empel; Vadim Banine

doi:10.1117/12.2535396

10 October 2019 EUV reticle defectivity protection options

Michael Lercel, Christophe Smeets, Mark van de Kerkhof, Amo Chen, Tjarko van Empel, Vadim Banine

Proceedings Volume 11148, Photomask Technology 2019; 111480Y (2019) https://doi.org/10.1117/12.2535396
Event: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States

Abstract

EUV pellicles have been enabled to provide customers with defect protection for EUV reticles. However, due to the absorption that is much higher than for DUV pellicles, using the pellicle has certain disadvantages. Most significant is the reduction in throughput caused by the absorption of EUV photons in the pellicle. This leads to a customer decision to use a pellicle and accept the reduced throughput, or to not use a pellicle and have additional inspection steps to check the cleanliness of the EUV reticle. These tradeoffs vary by customer and use case. This study addresses the balance of factors for using or not using a pellicle through a cost comparison.

Citation Download Citation

Michael Lercel, Christophe Smeets, Mark van de Kerkhof, Amo Chen, Tjarko van Empel, and Vadim Banine "EUV reticle defectivity protection options", Proc. SPIE 11148, Photomask Technology 2019, 111480Y (10 October 2019); https://doi.org/10.1117/12.2535396

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