Strategy for the breakthrough of RLS trade-off relationship in the development of novel resist materials and a developer

Ayako Nakajima; Manabu Hoshino; Kazunori Taguchi; Takahiro Kozawa

doi:10.1117/12.2536526

26 September 2019 Strategy for the breakthrough of RLS trade-off relationship in the development of novel resist materials and a developer

Ayako Nakajima, Manabu Hoshino, Kazunori Taguchi, Takahiro Kozawa

Author Affiliations +

Proceedings Volume 11148, Photomask Technology 2019; 1114814 (2019) https://doi.org/10.1117/12.2536526
Event: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States

Abstract

We developed novel resist materials and developer with fluorine atoms. Fluorine expected to show higher absorption coefficient than carbon because of its higher atomic number. From QCM, GPC, and SEM evaluation, it was found that ZEP-Y1 and ZEP-Y2 have a potential for next generation resist materials. The combination of resist material including fluorine atoms and fluorine solution is promising. This study showed the possibility of the extension of range for resist materials and developers.

Citation Download Citation

Ayako Nakajima, Manabu Hoshino, Kazunori Taguchi, and Takahiro Kozawa "Strategy for the breakthrough of RLS trade-off relationship in the development of novel resist materials and a developer", Proc. SPIE 11148, Photomask Technology 2019, 1114814 (26 September 2019); https://doi.org/10.1117/12.2536526

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