Paper
26 September 2019 High throughput AFM inspection system with parallel active cantilevers
M. Holz, C. Reuter, A. Reum, A. Ahmad, M. Hofmann, T. Ivanov, I. W. Rangelow, J. Stauffenberg, E. Manske, C. Du, X. Q. Zhou, N. Okamoto, A. N. Takashima, H. S. Lee
Author Affiliations +
Abstract
Atomic Force Microscopes are capable to provide non-destructive high resolution, CD-metrology and precise defect analysis. However, a conventional AFM has not enough throughput for today’s large scale semiconductor manufacturing. The primary point remains the increase of the scanning area in case of large wafers, masks, displays or dies. Cantilever array-based AFMs are intended to increase the imaging throughput by parallelizing the work of many AFM probes that may be practiced by parallel AFM systems that are capable to operate autonomously. An active cantilever scheme makes it possible to sense electronically the deflection and individually to control the actuation of every cantilever in the array. Each cantilever in the array represents a self-sustaining AFM-hardware system for metrology and imaging. In that, the multiple parallel probes are forming many AFMs capable to work independently.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Holz, C. Reuter, A. Reum, A. Ahmad, M. Hofmann, T. Ivanov, I. W. Rangelow, J. Stauffenberg, E. Manske, C. Du, X. Q. Zhou, N. Okamoto, A. N. Takashima, and H. S. Lee "High throughput AFM inspection system with parallel active cantilevers", Proc. SPIE 11148, Photomask Technology 2019, 111481E (26 September 2019); https://doi.org/10.1117/12.2537009
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KEYWORDS
Inspection

Atomic force microscopy

Actuators

Chemical mechanical planarization

Charged particle optics

Electron beams

Metrology

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