The direct absorption measurement of fused silica, CaF2, MgF2, and sapphire at VUV and IR region

K. Kato; C. Higashimura; S. Niisaka

doi:10.1117/12.2536388

20 November 2019 The direct absorption measurement of fused silica, CaF₂, MgF₂, and sapphire at VUV and IR region

K. Kato, C. Higashimura, S. Niisaka

Author Affiliations +

Proceedings Volume 11173, Laser-induced Damage in Optical Materials 2019; 111731K (2019) https://doi.org/10.1117/12.2536388
Event: SPIE Laser Damage, 2019, Broomfield (Boulder area), Colorado, United States

Abstract

The absorption of fused silica, CaF₂, MgF₂, and sapphire at VUV region (193.4 nm) and IR region (1070 nm) were measured. For this measurement, LID (Laser Induced Deflection) method was used because of its high sensitivity. We report the degradation behavior of materials by comparison of absorption before and after ArF laser irradiation, and also the ultra-minute absorption at IR wavelength. At each wavelength, the absorption of low OH fused silica before the laser irradiation showed the smallest. At ArF wavelength, sapphire and CaF₂ showed higher laser durability than MgF₂ and fused silica. At IR wavelength, VUV-transmissive sapphire showed a lower absorption compared to general sapphire.

Citation Download Citation

K. Kato, C. Higashimura, and S. Niisaka "The direct absorption measurement of fused silica, CaF₂, MgF₂, and sapphire at VUV and IR region", Proc. SPIE 11173, Laser-induced Damage in Optical Materials 2019, 111731K (20 November 2019); https://doi.org/10.1117/12.2536388

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