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15 November 2019 Front Matter: Volume 11175
Proceedings Volume 11175, Optifab 2019; 1117501 (2019) https://doi.org/10.1117/12.2559224
Event: SPIE Optifab, 2019, Rochester, New York, United States
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 11175, including the Title Page, Copyright information, Table of Contents, Author and Conference Committee lists.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Optifab 2019, edited by Blair L. Unger, Jessica DeGroote Nelson, Proceedings of SPIE Vol. 11175 (SPIE, Bellingham, WA, 2019) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510630635

ISBN: 9781510630642 (electronic)

Published by

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

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  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Auger, Hugues, 2C

Baghsiahi, Hadi, 0W

Beier, Matthias, 1E

Bergs, Thomas, 1U, 1V

Berkson, Joel D., 12

Binkele, T., 13

Blalock, Todd, 14

Bodlapati, Charan, 0E, 0F

Brooks, David, 0W

Brousseau, Denis, 2C

Brunelle, Matt, 14

Bulla, B., 0D

Chabot, Tristan, 2C

Chang, Jiun-Lee, 29

Chang, Shenq-Tsong, 20

Chen, Fong-Zhi, 23

Chen, Hua-Lin, 20, 29

Chen, Hung-Pin, 20, 29

Chen, Jun-Cheng, 23

Chen, Wei-Chun, 20

Chen, Xian-hua, 0A, 0K

Coniglio, Jen, 14

Da Costa Fernandes, B., 06

Dambon, O., 0D

DeFisher, Scott, 11, 15

DeGroote Nelson, Jessica, 14

DeMarco, Mike, 0O

Dembele, Vamara, 1L

Deng, Wen-hui, 0K

Doel, Peter, 0W

Doetz, M., 0D

du Jeu, Christian, 10

Dumas, Paul, 0Q

El Handrioui, Hassan, 10

Endo, Katsuyoshi, 1I

Essameldin, M., 13

Feldkamp, Roman, 0L

Ferralli, Ian, 14

Fleischmann, F., 13

Fourez, Julien, 10

Freischlad, Klaus R., 16

Garden, Rognvald, 1C

Gemmill, William R., 07

Gilles, Matthieu, 10

Green, Mark, 1C

Gross, Herbert, 1E

Grunwald, Tim, 1U, 1V

Hahne, F., 1B

Hall, Chris, 0O

Hartung, Johannes, 1E

Hashimoto, Kota, 1I

Heinisch, J., 1B

Henning, T., 13

Hilbig, D., 13

Hinrichs, Keith M., 12

Huang, Chien-Yao, 23, 29

Huang, Lei, 0M

Hyun, Sang-Won, 26, 2B, 2E

Idir, Mourad, 0M

Ikeda, Yusuke, 1Y

Iles, Shawn, 05, 19

Je, Soonkyu, 2B

Jeon, Min-Woo, 26

Jeong, Byeong-Jun, 2E

Jeong, Seok-Kyeong, 26, 2E

Jones, Martyn, 0W

Kang, Di, 0E, 0F

Kang, Jong-Gyun, 26, 2E

Kang, Jungmin, 1I

Kim, Daesuk, 1L

Kim, Geon-Hee, 26, 2B, 2E

Knight, Terry, 07

Koliopoulos, Chris L., 16

Kraft, Nicholas, 07

Lambropoulos, John C., 08, 0I

Lammers, Tom, 1E

Lang, W., 13

Langehanenberg, P., 1B

Lee, Won-Kyun, 2E

Leibowitz, Noah, 0I

Li, Shugang, 1O

Liao, Defeng, 0A

Liao, Kai, 21

Lin, Wei-Cheng, 20, 23, 29

Lin, Yu-Wei, 20

Liu, Bin, 21

Liu, Mincai, 1O

Liu, Zhichao, 1O

Lucas, Felix, 0H

Luo, Jing, 1O

Lynch, Tim, 14

Maloney, Chris, 0N, 0Q

Mandina, Mike, 04

Martin, Tony R., 07

Maunier, C., 06

Mei, Xuesong, 21

Mende, Hendrik, 1V

Messner, William, 0N

Murphy, Paul E., 0Z

Myer, Brian, 14

Navare, Jayesh, 0E, 0F

Neauport, J., 06

Nelson, Jayson, 05, 19

Okura, Yukinobu, 1S

Olszak, Artur G., 17

Pan, Aifei, 21

Pan, Feng, 1O

Pomerantz, Michael, 08, 0I

Qiao, Jie, 08

Quattrociocchi, Nick, 14

Ravindra, Deepak, 0E, 0F

Redien, M., 06

Rinkus, M., 0B

Rojacher, Cornelia, 1U

Roll, Christopher D., 12

Ross, James, 11, 15

Rumpel, Armin, 0P

Ruppel, Thomas, 0P

Salsbury, Chase, 17

Schmelzer, Olaf, 0H

Schmitt, Robert Heinrich, 1V

Sebastian, Thomas, 12

Shahinian, Hossein, 0E, 0F

Sukegawa, Takashi, 1S

Sung, Cheng-Kuo, 20

Supranowitz, Chris, 0Z

Tayabaly, Kashmira, 0M

Taylor, Lauren, 08

Thibault, Simon, 2C

Toyoshi, Yui, 1I

VanKouwenberg, Jim, 04

Vogel, Paul-Alexander, 1V

Vu, Anh-Tuan, 1U, 1V

Waak, Thomas, 0H

Wang, Chung-Ying, 23

Wang, Jian, 0A, 1O

Wang, Jung Hsing, 23

Wang, Tianyi, 0M

Wang, Wenjun, 21

Wang, Zheng, 1O

Watson, Stephen, 0O

Wei, Yaowei, 1O

Wen, Sheng-lin, 0K

Wen, Sy-Bor, 1P

Williamson, Ray, 1D

Wolfs, Franciscus, 11

Wu, Qian, 1O

Wu, Wen-Hong, 29

Xie, Ruiqing, 0A

Xu, Jing, 08

Xu, Qiao, 0A

Yamada, Itsunari, 1Y

Yeo, Woo-Jong, 26, 2E

Zaytsev, Dmytro, 0E, 0F

Zhang, Fei, 1O

Zhang, Hongjie, 1P

Zhang, Qinghua, 0A

Zhao, Shijie, 0A

Zheng, Nan, 0K

Zhong, Bo, 0K

Conference Committee

Conference Chairs

  • Blair L. Unger, Rochester Precision Optics, LLC (United States)

  • Jessica DeGroote Nelson, Optimax Systems, Inc. (United States)

Conference Program Committee

  • Thomas Battley, New York Photonics Industry Association (United States)

  • Michael J. Bechtold, OptiPro Systems, LLC (United States)

  • Rebecca Wilson Borrelli, Harris Corporation (United States)

  • Christopher T. Cotton, ASE Sailing Inc. (United States)

  • John P. Deegan, Rochester Precision Optics, LLC (United States)

  • Michael A. DeMarco, QED Optics (United States)

  • Apostolos Deslis, JENOPTIK Optical Systems, LLC (United States)

  • Dan Gauch, Schneider Optical Machines Inc. (United States)

  • Tom M. Godin, Satisloh North America Inc. (United States)

  • Heidi Hofke, OptoTech Optical Machinery Inc. (United States)

  • Dhananjay Joshi, Clemson University (United States)

  • Jay Kumler, JENOPTIK Optical Systems, LLC (United States)

  • Justin J. Mahanna, Universal Photonics Inc. (United States)

  • Michael A. Marcus, Lumetrics, Inc. (United States)

  • Michael N. Naselaris, Sydor Optics, Inc. (United States)

  • Richard Nastasi, Universal Photonics Inc. (United States)

  • John J. Nemechek, Metrology Concepts LLC (United States)

  • Matthias Pfaff, OptoTech Optikmaschinen GmbH (Germany)

  • Paul Tolley, Stretford End Solutions (United States)

  • Martin J. Valente, Arizona Optical Systems, LLC (United States)

  • Kirk J. Warden, LaCroix Precision Optics (United States)

Session Chairs

  • Plenary Session

    Jessica DeGroote Nelson, Optimax Systems, Inc. (United States)

  • Advancements in Conventional Fabrication Methods

    Blair L. Unger, Rochester Precision Optics, LLC (United States)

  • Integrating Automation and Lasers into Optics Fabrication

    Matthew J. Brunelle, Optimax Systems, Inc. (United States)

  • Deterministic Processing of Optics

    Dan Gauch, Schneider Optical Machines Inc. (United States)

  • Deterministic Finishing Processes

    Kirk J. Warden, LaCroix Precision Optics (United States)

  • New Advances in Optical Materials

    Nicholas Bilis, Ohara Corporation (United States)

  • Optical Engineering

    Jamie L. Ramsey, Rochester Precision Optics, LLC (United States) Freeform Manufacturing

    Scott DeFisher, OptiPro Systems, LLC (United States)

  • Advances in Freeform and Novel Metrology Techniques

    Edward Fess, Corning Inc. (United States)

  • Surface Roughness and Optical Alignment

    Matthias Pfaff, OptoTech Optikmaschinen GmbH (Germany)

  • Mid-spatial Frequency and Wavefront Error Measurement Methods

    John J. Nemechek, Metrology Concepts LLC (United States)

  • Optical Coatings

    Thomas Battley, New York Photonics Industry Association (United States)

  • Structured Optical Surfaces

    Dhananjay Joshi, Clemson University (United States)

© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 11175", Proc. SPIE 11175, Optifab 2019, 1117501 (15 November 2019); https://doi.org/10.1117/12.2559224
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