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27 June 2019 Research on photomask process for FPD
Kouichi Murakami, Takumi Uemura, Shuichi Ojima
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Proceedings Volume 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology; 1117805 (2019) https://doi.org/10.1117/12.2533422
Event: Photomask Japan 2019, 2019, Yokohama, Japan
Abstract
FSCE focused on resist materials and coordinate correction technology for FPD mask and carried out research on underlying technology. The results we obtained are reported.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Kouichi Murakami, Takumi Uemura, and Shuichi Ojima "Research on photomask process for FPD", Proc. SPIE 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117805 (27 June 2019); https://doi.org/10.1117/12.2533422
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KEYWORDS
Photomasks
Photoresist processing
Data corrections
Photoresist materials
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