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30 December 2019 Vertical directional coupler network using a-Si slope waveguides
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A CMOS compatible three-dimensional (3D) integrated photonics circuit for multilayer silicon photonics is reported. Slopes with angles between 10o and 15° were created in the oxide layer using single step wet etching to connect the two Si waveguide layers. Amorphous Si (a-Si) deposited using hot wire chemical vapor deposition (HWCVD) at a temperature of 230°C was used to fabricate the device. Losses of 0.5 dB/slope were measured in the slope waveguides at 1310 nm wavelength. As a demonstration, we propose a 4x4 network switch using a-Si based vertical directional coupler.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
V. Mittal, R. Petra, A. Tarazona, N. J. Dinsdale, A. Khokhar, M. Banakar, D. Thomson, O. L. Musken, G. T. Reed, and H. M. H. Chong "Vertical directional coupler network using a-Si slope waveguides", Proc. SPIE 11200, AOS Australian Conference on Optical Fibre Technology (ACOFT) and Australian Conference on Optics, Lasers, and Spectroscopy (ACOLS) 2019, 112001W (30 December 2019);

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