Interferometry In Microlithography

A. G. Shapiro; P. F. Makiyenkov

doi:10.1117/12.961336

3 April 1989 Interferometry In Microlithography

A. G. Shapiro, P. F. Makiyenkov

Proceedings Volume 1121, Interferometry '89; (1989) https://doi.org/10.1117/12.961336
Event: Interferometry '89, 1989, Warsaw, Poland

Abstract

A simple method based on the interferometry principles was developed for control and analysis of photoresist layers at the stages of their thermal treatment and exposure. Application of this method makes it possible to increase integration of VLSI by creating elements with characteristic measures less than one micron.

Citation Download Citation

A. G. Shapiro and P. F. Makiyenkov "Interferometry In Microlithography", Proc. SPIE 1121, Interferometry '89, (3 April 1989); https://doi.org/10.1117/12.961336

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