Stable Polarizing Beamsplitters Deposited By Reactive Ion Plating

Karl H. Guenther; Zeev Taubenfeld; Paul Sachdeva; K. Balasubramanian

doi:10.1117/12.961364

8 January 1990 Stable Polarizing Beamsplitters Deposited By Reactive Ion Plating

Karl H. Guenther, Zeev Taubenfeld, Paul Sachdeva, K. Balasubramanian

Proceedings Volume 1125, Thin Films in Optics; (1990) https://doi.org/10.1117/12.961364
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France

Abstract

Dielectric multilayer thin film stacks deposited on glass plates or prisms can work as polarizing beam splitters when used at an oblique angle of light incidence. Coatings deposited in vacuum by conventional electron beam or reactive thermal evaporation have an inherently large internal surface area, because of the columnar micro-structure, and have packing densities less than unity. Exposed to ambient humid air, their spectral response and polarization characteristics change. The cause is adsorption or desorption of water vapor on their inner surfaces upon changes in humidity and temperature. The novel deposition technique of low voltage reactive ion plating produces thin films with a packing density of unity or higher. This prevents them from any uptake of humidity at all. We demonstrate the fabrication of stable polarizing beamsplitters for the HeNe wavelength of 632.8 nm by this technique.

Citation Download Citation

Karl H. Guenther, Zeev Taubenfeld, Paul Sachdeva, and K. Balasubramanian "Stable Polarizing Beamsplitters Deposited By Reactive Ion Plating", Proc. SPIE 1125, Thin Films in Optics, (8 January 1990); https://doi.org/10.1117/12.961364

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