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(100) oriented PLZT(28/0/100) thin solid films on the amorphous substrates have been deposited by R.F. planar magnetron sputtering with the powder targets. Only (100), (200) peaks were found in the XRD spectrUm. The oriented degree F(100) is about one. Transmission of the thin films is more than 80% in visible spectrum. As-sputtered PLT thin fillms are amorphous. After annealing at 600°C/4hr. in air, the thin films were crystallized and oriented grow along (100) direction on the amorphous substrates. The composition of the target and thin filMs may be different which is depended on the deposition conditions such as substrate temperature, sputtering voltage and so on. The ratio of Pb/La becomes smaller as the substrate temperature goes higher and the ratio of Ti/La becomes larger as substrate temperature goes higher. Stoichiometric PLT thin films were obtained by varying the composition of the target at same deposition conditions.
Yuhang Huang,Weigen Luo,Aili Din,Ming Ge, andXiantong Chen
"Oriented Growth PLT Thin Films On Amorphous Substrates", Proc. SPIE 1126, Electro-Optic and Magneto-Optic Materials and Applications, (14 December 1989); https://doi.org/10.1117/12.961377
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Yuhang Huang, Weigen Luo, Aili Din, Ming Ge, Xiantong Chen, "Oriented Growth PLT Thin Films On Amorphous Substrates," Proc. SPIE 1126, Electro-Optic and Magneto-Optic Materials and Applications, (14 December 1989); https://doi.org/10.1117/12.961377