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22 December 1989 Characterization Of Insulating Photorefractive Materials
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Proceedings Volume 1127, Nonlinear Optical Materials II; (1989)
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France
Widespread application of photorefractive materials depends to a great extent on the possibility of optimizing the extrinsic optical, electrical and photo-electrical properties which are indeed closely related to crystalline defects and impurities. This paper recalls how deep levels are involved in the figures of merit which characterize the performance of the photorefractive materials. Some fundamental difficulties for characterizing and controlling defects in insulators are reviewed. New opportunities are provided by the recent development of specific thermal and optical spectroscopic methods. The techniques are based on transient photoconductivity and differential optical measurements. The principles of the methods are described shortly. Typical results obtained with Bi12 Ge 020 are presented.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jean P. Zielinger, Mayer Tapiero, Jean G. Gies, and Jean C. Launay "Characterization Of Insulating Photorefractive Materials", Proc. SPIE 1127, Nonlinear Optical Materials II, (22 December 1989);

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