Next generation optical design methodology

Alessandra Croce

doi:10.1117/12.2544265

2 March 2020 Next generation optical design methodology

Alessandra Croce

Proceedings Volume 11287, Photonic Instrumentation Engineering VII; 1128709 (2020) https://doi.org/10.1117/12.2544265
Event: SPIE OPTO, 2020, San Francisco, California, United States

Abstract

As the requirements for high performance optical systems become more and more demanding it is increasingly important that every stage of the optical design process is tuned to ensure that manufactured systems meet specification. Traditionally the design steps of optimization and tolerancing have been treated separately which could result in a large divergence between the optical performance of the nominal, or unperturbed, system and that of an as-built system with realistic manufacturing and assembly errors. This divergence can lead to lower product yields or the requirements for tighter tolerances and hence increased costs. In this paper we demonstrate how including the effects of tolerance defects in the optimization step, through Zemax OpticStudio’s new High-Yield Optimization, can result in systems with higher as-built performance at potentially lower cost. We will present a case study showing the utility of this technique on a high-performance imaging system (such as may be found in medical or consumer electronics applications). The results of the High-Yield Optimization will be compared to those of a system designed to an identical set of specifications and using the same realistic tolerances with the traditional method. A detailed analysis of the resulting design forms will be performed, and the key considerations and improvements of the High-Yield Optimization discussed.

Conference Presentation

Citation Download Citation

Alessandra Croce "Next generation optical design methodology", Proc. SPIE 11287, Photonic Instrumentation Engineering VII, 1128709 (2 March 2020); https://doi.org/10.1117/12.2544265

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