Precision interferometric measurement of optical flat using wavelength tuning Fizeau interferometer

Yangjin Kim; Jiwon Seo; Sungtae Kim; Wonjun Bae; Mamoru Mitsuishi

doi:10.1117/12.2544324

2 March 2020 Precision interferometric measurement of optical flat using wavelength tuning Fizeau interferometer

Yangjin Kim, Jiwon Seo, Sungtae Kim, Wonjun Bae, Mamoru Mitsuishi

Proceedings Volume 11287, Photonic Instrumentation Engineering VII; 112871D (2020) https://doi.org/10.1117/12.2544324
Event: SPIE OPTO, 2020, San Francisco, California, United States

Abstract

Wavelength-tuning interferometry has been widely used for measuring the thickness variation of optical devices used in the semiconductor industry. However, in wavelength-tuning interferometry, the nonlinearity of phase shift causes a spatially uniform error in the calculated phase distribution. In this study, the spatially uniform error is formulated using Taylor series. A new 9-sample phase-shifting algorithm is proposed, with which the uniform spatial phase error can be eliminated. Finally, optical-thickness variation of transparent plate is measured using the proposed algorithm and wavelength-tuning Fizeau interferometer.

Citation Download Citation

Yangjin Kim, Jiwon Seo, Sungtae Kim, Wonjun Bae, and Mamoru Mitsuishi "Precision interferometric measurement of optical flat using wavelength tuning Fizeau interferometer", Proc. SPIE 11287, Photonic Instrumentation Engineering VII, 112871D (2 March 2020); https://doi.org/10.1117/12.2544324

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