Scalable fabrication of nano-architected materials using 3D interference lithography with metasurfaces at visible wavelengths (Conference Presentation)

Phillippe Pearson; Seyedeh Mahsa Kamali; Farzaneh Afshinmanesh; Luizetta Navrazhnykh; Ryan Ng; Andrei Faraon; Julia R. Greer

doi:10.1117/12.2555112

10 March 2020 Scalable fabrication of nano-architected materials using 3D interference lithography with metasurfaces at visible wavelengths (Conference Presentation)

Phillippe Pearson, Seyedeh Mahsa Kamali, Farzaneh Afshinmanesh, Luizetta Navrazhnykh, Ryan Ng, Andrei Faraon, Julia R. Greer

Author Affiliations +

Proceedings Volume 11289, Photonic and Phononic Properties of Engineered Nanostructures X; 112890I (2020) https://doi.org/10.1117/12.2555112
Event: SPIE OPTO, 2020, San Francisco, California, United States

Abstract

Nano-architected materials have the potential to be adopted in several areas including photonic devices and structural materials. We present a 3D interference lithography technique with dielectric metasurfaces at visible wavelengths that allows patterning of thick epoxide films over areas on the order of 10 cm^2 with 100 nm resolution. By leveraging the ability of the metasurface to control the amplitude and phase of a wavefront, complex near-field 3D interference patterns can be designed. Pyrolysis of 3D patterned SU-8 produces a carbon-based material with sub-100 nm features and enhanced mechanical properties.

Conference Presentation

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Phillippe Pearson, Seyedeh Mahsa Kamali, Farzaneh Afshinmanesh, Luizetta Navrazhnykh, Ryan Ng, Andrei Faraon, and Julia R. Greer "Scalable fabrication of nano-architected materials using 3D interference lithography with metasurfaces at visible wavelengths (Conference Presentation)", Proc. SPIE 11289, Photonic and Phononic Properties of Engineered Nanostructures X, 112890I (10 March 2020); https://doi.org/10.1117/12.2555112

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