Paper
26 October 1989 Status Of The Work At Frascati On Large Aperture And High Repetition Rate Excimer Lasers
S. Bollanti, P. Di Lazzaro, A. Dipace, F. Flora, G. Giordano, T. Hermsen, T. Letardi, E. Sabia, C. E. Zheng
Author Affiliations +
Proceedings Volume 1132, High Power Lasers and Laser Machining Technology; (1989) https://doi.org/10.1117/12.961565
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France
Abstract
Increasing interest has been shown in scaling excimer lasers to high average power either with a high energy per pulse or with a high repetition rate since their applications are very promising and attractive in several fields, such as materials processing, photochemistry, and so on. In order to cover a broad range of applications, the work at the ENEA Frascati laboratories has mainly been devoted to developing two different discharge-excited laser sources, one operating at - 10 J/pulse and a repetition rate of - 100 Hz, and the other at 1 J/pulse and a repetition rate of - 1 kHz. As an intermediate step, two x-ray preionized XeCl laser discharge devices were studied: one device has a discharge volume of 10 liters (10x10x100 cm3) (Laser:L) with a longi-tudinal gas flow mode in the discharge region, while the other operates in a transverse gas flow mode with a discharge volume of 0.45 liters (3x3x50 cm3) (Laser:S)*. Some of the experimental results obtained with the two devices are described in this report.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Bollanti, P. Di Lazzaro, A. Dipace, F. Flora, G. Giordano, T. Hermsen, T. Letardi, E. Sabia, and C. E. Zheng "Status Of The Work At Frascati On Large Aperture And High Repetition Rate Excimer Lasers", Proc. SPIE 1132, High Power Lasers and Laser Machining Technology, (26 October 1989); https://doi.org/10.1117/12.961565
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Cited by 3 scholarly publications and 3 patents.
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KEYWORDS
Diodes

Laser applications

X-rays

Capacitors

Laser energy

Semiconductor lasers

Plasma

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