Noise fidelity in SEM simulation

Benjamin D. Bunday

doi:10.1117/12.2559631

20 March 2020 Noise fidelity in SEM simulation

Benjamin D. Bunday

Proceedings Volume 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV; 113250R (2020) https://doi.org/10.1117/12.2559631
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

The different typical noise components observed in SEMs are important aspects to image quality and thus performance, yet models for adding realistic noise to model-generated images is an area where improvement of SEM simulation is important for addressing critical IC industry applications. Understanding how realistic factors affect the achieved noise distribution is important to achieve realistic noise characteristic fidelity in simulated images with respect to experimental images. Achieving realistic noise is important to enable simulations to help address many industry issues, such as minimizing line edge roughness measurement uncertainty. In this work, JMONSEL will be used to simulate various test structures with many repeats to observe how the noise distribution changes spatially, which will allow us to understand the noise dependencies on material and local geometry, which should give insight into the possible need for more detailed attention to how noise is applied to analytically-generated images.

Conference Presentation

Citation Download Citation

Benjamin D. Bunday "Noise fidelity in SEM simulation", Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 113250R (20 March 2020); https://doi.org/10.1117/12.2559631

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