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24 March 2020 Critical-dimension grazing-incidence small angle X-Ray scattering: applications and development (Conference Presentation)
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Abstract
As the lithographically manufactured nanostructures are shrinking in size, conventional techniques, such as microscopies (SEM, AFM) reach their resolution limits. We have developed a high-performance Grazing Incidence SAXS simulation tool to reconstruct the in-depth profile highly ordered material such as line gratings [1, 2]. Here, we will present the latest development and applications of the technique using x-rays to characterize line gratings and contact holes. Specifically, we will show how the CD-GISAXS approach has been extended to extract the in-depth profile dispersion of the lines, leading to a quantification of the line edge roughness. Finally, by introducing a recent study which harnessed the chemical sensitivity provided by soft x-ray scattering to extract latent image profiles from resists [3], we highlight new applications for this technique with high potential.
Conference Presentation
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Guillaume Freychet, Dinesh Kumar, Isvar A. Cordova, Ron J. Pandolfi, Patrick P. Naulleau, Cheng Wang, and Alex Hexemer "Critical-dimension grazing-incidence small angle X-Ray scattering: applications and development (Conference Presentation)", Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 113251A (24 March 2020); https://doi.org/10.1117/12.2552155
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