Paper
23 March 2020 Unique freeze cleaning technology
Daisuke Matsushima, Kensuke Demura, Sadayuki Jimbo, Kei Hattori
Author Affiliations +
Abstract
In this work, a novel chemical-free technique is proposed to remove adsorbed particles of less than 100 nm from a substrate. More specifically, the small particles buried under the "stagnant layer" were removed using a process that relied on the force generated by volumetric expansion on rapid freezing of supercooled water. In the process, water penetrated into the small (narrow) spaces via the capillary force; it then flowed into the narrow interfacial gap between the substrate and particles, and lifted the particles off the substrate via the volumetric expansion force on ice formation. Because fine patterns have no such gaps, they are not damaged during this process. In other words, unlike conventional cleaning technologies, such as mega sonic cleaning and two-fluid jet cleaning, this cleaning process is able to specifically target the small particles while the fine patterns are unaffected.
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daisuke Matsushima, Kensuke Demura, Sadayuki Jimbo, and Kei Hattori "Unique freeze cleaning technology", Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 113260P (23 March 2020); https://doi.org/10.1117/12.2551972
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Particles

Photomasks

Solids

Temperature metrology

Liquids

Cryogenics

Quartz

Back to Top