Highly substituted fullerene-based spin-on organic hardmasks

Alan G. Brown; Guy Dawson; Greg O'Callaghan; Carmen Popescu; Alexandra McClelland; Tom Lada; Bryan Schofield; Warren Montgomery; Alex P. G. Robinson

doi:10.1117/12.2552215

23 March 2020 Highly substituted fullerene-based spin-on organic hardmasks

Alan G. Brown, Guy Dawson, Greg O'Callaghan, Carmen Popescu, Alexandra McClelland, Tom Lada, Bryan Schofield, Warren Montgomery, Alex P. G. Robinson

Author Affiliations +

Proceedings Volume 11326, Advances in Patterning Materials and Processes XXXVII; 1132618 (2020) https://doi.org/10.1117/12.2552215
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Irresistible Materials has previously introduced the HM340 series of fullerene based spin-on carbon hardmasks, and reported on material characterization, including very high carbon content and high thermal stability. The materials have a low Ohnishi number providing high etch durability and the low hydrogen level allows for high resolution etching without wiggling. In order to further increase semiconductor facilities (Fab) compatibility, thermal stability and etch resistance several new formulations are under development. Here we present the latest results for our new HM1360 series, avoiding the drain test issues encountered with higher concentration HM340 formulations, together with new and updated characterisation results for the more advanced formulations.

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Alan G. Brown, Guy Dawson, Greg O'Callaghan, Carmen Popescu, Alexandra McClelland, Tom Lada, Bryan Schofield, Warren Montgomery, and Alex P. G. Robinson "Highly substituted fullerene-based spin-on organic hardmasks", Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 1132618 (23 March 2020); https://doi.org/10.1117/12.2552215

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