Proteus SMO for process window improvement

Kun-Yuan Chen; Andy Lan; Richer Yang; Jing Jing Liu; Ting Ting Xu; Cheng-Shuan Lin; Hua Ding; Chih-Jie Lee; Thuc Dam; Jianjun Jia

doi:10.1117/12.2552230

23 March 2020 Proteus SMO for process window improvement

Kun-Yuan Chen, Andy Lan, Richer Yang, Jing Jing Liu, Ting Ting Xu, Cheng-Shuan Lin, Hua Ding, Chih-Jie Lee, Thuc Dam, Jianjun Jia

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Proceedings Volume 11327, Optical Microlithography XXXIII; 1132711 (2020) https://doi.org/10.1117/12.2552230
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

As technology continues to scale aggressively, source mask optimization (SMO) is now a key resolution enhancement technique (RET) to maximize the process window. Synopsys© has developed new source mask optimization tool Proteus SMO that demonstrated this improvement. Proteus SMO is equipped with comprehensive functionalities for computing the optimum source and mask. High flexibilities of source types, mask recipes, models, optimizers, and cost functions are provided. For enabling accurate simulation results, integration of Sentaurus Lithography (S-Litho) is also possible when needed. Moreover, the industrial-proven Inverse Lithography Technology (Proteus ILT) mask synthesis is integrated within Proteus SMO further maximizing the process window. Taking advantage of ILT and SLitho simulation solutions, Proteus SMO could achieve significant lithographic performance improvement.

Citation Download Citation

Kun-Yuan Chen, Andy Lan, Richer Yang, Jing Jing Liu, Ting Ting Xu, Cheng-Shuan Lin, Hua Ding, Chih-Jie Lee, Thuc Dam, and Jianjun Jia "Proteus SMO for process window improvement", Proc. SPIE 11327, Optical Microlithography XXXIII, 1132711 (23 March 2020); https://doi.org/10.1117/12.2552230

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KEYWORDS

Source mask optimization

Photomasks

Semiconducting wafers

Lithography

Nanoimprint lithography

Resolution enhancement technologies

Photovoltaics

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