Magnification of diffraction patterns using plane wave illumination

Zhe Kong; Ning Xu; Qiaofeng Tan

doi:10.1117/12.2545433

18 December 2019 Magnification of diffraction patterns using plane wave illumination

Zhe Kong, Ning Xu, Qiaofeng Tan

Proceedings Volume 11335, AOPC 2019: Display Technology and Optical Storage; 113350A (2019) https://doi.org/10.1117/12.2545433
Event: Applied Optics and Photonics China (AOPC2019), 2019, Beijing, China

Abstract

When plane wave is used to illuminate Diffractive optical elements (DOEs), the maximum size of the diffraction pattern is limited by the wavelength of the incident beam, the distance from the DOE to the output plane and the sampling interval of the DOE. In this paper, a method is proposed to magnify the maximum size of the diffraction pattern with an introduced intermediate plane and two-step diffraction calculation. Zero padding is used on the DOE plane, the sampling interval on the intermediate plane is correspondingly decreased, and the size of the diffraction pattern is magnified. The accompanied image aliasing is eliminated by placing a low-pass filter on the intermediate plane. The light field distribution on the output plane conforms two-dimensional sinc function as a consequence of the discretization of phases of DOEs. In order to get a uniform diffraction pattern, it is necessary to preprocess the target diffraction pattern. Both numerical simulations and experimental results show the validity of the proposed method.

Citation Download Citation

Zhe Kong, Ning Xu, and Qiaofeng Tan "Magnification of diffraction patterns using plane wave illumination", Proc. SPIE 11335, AOPC 2019: Display Technology and Optical Storage, 113350A (18 December 2019); https://doi.org/10.1117/12.2545433

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KEYWORDS

Diffraction

Diffractive optical elements

Near field diffraction

Fourier transforms

Linear filtering

Spherical lenses

Digital holography

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