Design Principles For An Illumination System Using An Excimer Laser As A Light Source

Johannes Wangler; J. Liegel

doi:10.1117/12.961753

11 October 1989 Design Principles For An Illumination System Using An Excimer Laser As A Light Source

Johannes Wangler, J. Liegel

Proceedings Volume 1138, Optical Microlithography and Metrology for Microcircuit Fabrication; (1989) https://doi.org/10.1117/12.961753
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France

Abstract

Design principles for the illumination system of a DUV wafer stepper are derived by examining the coherence properties of a KrF excimer laser and the effect of DUV radiation of high energy density on fused silica, the material used for the optical components. Alternative designs are presented and discussed.

Citation Download Citation

Johannes Wangler and J. Liegel "Design Principles For An Illumination System Using An Excimer Laser As A Light Source", Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); https://doi.org/10.1117/12.961753

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available