Characterization of position and two-dimensional profiles of high-density beam spot array for digital lithography system

Yunhyeok Ko; Changmin Lee; Jae Hahn

doi:10.1117/12.2567574

19 August 2020 Characterization of position and two-dimensional profiles of high-density beam spot array for digital lithography system

Yunhyeok Ko, Changmin Lee, Jae Hahn

Author Affiliations +

Proceedings Volume 11509, Optics and Photonics for Information Processing XIV; 115090H (2020) https://doi.org/10.1117/12.2567574
Event: SPIE Optical Engineering + Applications, 2020, Online Only

Abstract

This Conference Presentation, "Characterization of position and two-dimensional profiles of high-density beam spot array for digital lithography system," was recorded for SPIE Optics + Photonics Digital Forum 2020.

Conference Presentation

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Yunhyeok Ko, Changmin Lee, and Jae Hahn "Characterization of position and two-dimensional profiles of high-density beam spot array for digital lithography system", Proc. SPIE 11509, Optics and Photonics for Information Processing XIV, 115090H (19 August 2020); https://doi.org/10.1117/12.2567574

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KEYWORDS

Lithography

Charge-coupled devices

Digital micromirror devices

Inspection

Beam shaping

Lenses

Optical filtering

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