Ultrafast-laser-enabled Polishing, and Waveguide Writing for Optics and Microchip Laser Fabrications

Jie Qiao; Tao Feng; Pankaj K. Sahoo; Gong Chen

doi:10.1117/12.2574567

21 September 2020 Ultrafast-laser-enabled Polishing, and Waveguide Writing for Optics and Microchip Laser Fabrications

Jie Qiao, Tao Feng, Pankaj K. Sahoo, Gong Chen

Proceedings Volume 11514, Laser-induced Damage in Optical Materials 2020; 115140H (2020) https://doi.org/10.1117/12.2574567
Event: SPIE Laser Damage, 2020, Online Only

Abstract

Ultrafast lasers enable non-contact, waste free, precise material removal. We have demonstrated single-digit nanometer precision polishing of optical material using a femtosecond laser. For ultrafast-laser-based waveguide writing, we study the underlying physics behind nonlinear optical dynamics during the femtosecond laser processing of crystalline materials. Unidirectional pulse propagation equation simulation is carried out to study the evolution of energy, fluence, plasma generation, and beam waist of a femtosecond pulse along the propagation direction under different energy and focusing conditions. Waveguides having a loss of 0.21 dB/cm are obtained. A Nd:YAG based waveguide laser with lasing threshold of 50 mw was demonstrated.

Conference Presentation

Citation Download Citation

Jie Qiao, Tao Feng, Pankaj K. Sahoo, and Gong Chen "Ultrafast-laser-enabled Polishing, and Waveguide Writing for Optics and Microchip Laser Fabrications", Proc. SPIE 11514, Laser-induced Damage in Optical Materials 2020, 115140H (21 September 2020); https://doi.org/10.1117/12.2574567

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