Mo Silicide EUV pellicle

Ha Neul Kim; Yong Ju Jang; Seong Ju Wi; Chang Soo Kim; Jinho Ahn

doi:10.1117/12.2572975

20 September 2020 Mo Silicide EUV pellicle

Ha Neul Kim, Yong Ju Jang, Seong Ju Wi, Chang Soo Kim, Jinho Ahn

Author Affiliations +

Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 115170A (2020) https://doi.org/10.1117/12.2572975
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

Molybdenum disilicide (MoSi2) pellicle membrane was fabricated and its optical/thermal properties were compared with Ru-capped pellicle and SiNx pellicle. EUV reflectance was measured through EUV Coherent Scattering Microscope, and thermal stability was evaluated using 355nm laser source emulating EUV exposure condition. As a result, it was confirmed that MoSi2 pellicle showed sufficiently lower reflectance and comparable thermal durability under 300 W EUV matched source power compares with the Ru-capped SiNx pellicle. Further study is now underway to improve emissivity and mechanical stability.

Conference Presentation

Citation Download Citation

Ha Neul Kim, Yong Ju Jang, Seong Ju Wi, Chang Soo Kim, and Jinho Ahn "Mo Silicide EUV pellicle", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 115170A (20 September 2020); https://doi.org/10.1117/12.2572975

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