Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings

Sophia Schröder; Lukas Bahrenberg; Nimet Kutay Eryilmaz; Sven Glabisch; Serhiy Danylyuk; Sascha Brose; Jochen Stollenwerk; Peter Loosen

doi:10.1117/12.2573148

13 October 2020 Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings

Sophia Schröder, Lukas Bahrenberg, Nimet Kutay Eryilmaz, Sven Glabisch, Serhiy Danylyuk, Sascha Brose, Jochen Stollenwerk, Peter Loosen

Author Affiliations +

Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 115170S (2020) https://doi.org/10.1117/12.2573148
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

In this contribution the accuracy of measurements performed with a stand-alone EUV spectrometer is analyzed. The setup is used to determine optical constants and dimensional characteristics of samples, e.g. ultrathin films or nanoscale gratings. For this purpose, measurements of the broadband EUV reflectance of the samples at variable grazing incidence angles are used to reconstruct sample parameters in a model-based approach. The accuracy of these measurements is a crucial factor for a reliable characterization of samples. We present an overview on the sources of uncertainties in the experimental setup as well as improvements to the setup that improves its accuracy. Additionally, the reconstruction accuracy of the optical constants is analyzed. A focus is put on the influence of the experimental uncertainty and the range of incidence angles used for reflectance measurements.

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Sophia Schröder, Lukas Bahrenberg, Nimet Kutay Eryilmaz, Sven Glabisch, Serhiy Danylyuk, Sascha Brose, Jochen Stollenwerk, and Peter Loosen "Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 115170S (13 October 2020); https://doi.org/10.1117/12.2573148

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