Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging

Ricarda Nebling; Hyun-su Kim; Uldis Locans; Atoosa Dejkameh; Yasin Ekinci; Iacopo Mochi

doi:10.1117/12.2573181

12 October 2020 Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging

Ricarda Nebling, Hyun-su Kim, Uldis Locans, Atoosa Dejkameh, Yasin Ekinci, Iacopo Mochi

Author Affiliations +

Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 115170W (2020) https://doi.org/10.1117/12.2573181
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

RESCAN is a coherent diffraction imaging based APMI microscope prototype. A complex image of the EUV reticle is reconstructed from diffraction patterns collected on a CCD detector. With the next upgrade of the tool, the resolution will be enhanced from the current 34 nm down to 20 nm on mask. Also the illumination NA value will change from the current range of 0.002 to 0.02 to a value of 0.035. Here, we study how a change of the illumination NA affects the EUV mask inspection in simulation. We observe a better image quality, lower object error and higher defect sensitivity with increasing illumination NA.

Conference Presentation

Citation Download Citation

Ricarda Nebling, Hyun-su Kim, Uldis Locans, Atoosa Dejkameh, Yasin Ekinci, and Iacopo Mochi "Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 115170W (12 October 2020); https://doi.org/10.1117/12.2573181

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