High NA EUV scanner: obscuration and wavefront description

Laurens de Winter; Timur Tudorovskiy; Jan van Schoot; Kars Troost; Erwin Stinstra; Stephen Hsu; Toralf Gruner; Juergen Mueller; Ruediger Mack; Bartosz Bilski; Joerg Zimmermann; Paul Graeupner

doi:10.1117/12.2572878

18 November 2020 High NA EUV scanner: obscuration and wavefront description

Laurens de Winter, Timur Tudorovskiy, Jan van Schoot, Kars Troost, Erwin Stinstra, Stephen Hsu, Toralf Gruner, Juergen Mueller, Ruediger Mack, Bartosz Bilski, Joerg Zimmermann, Paul Graeupner

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Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 1151715 (2020) https://doi.org/10.1117/12.2572878
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

The high NA=0.55 EUV scanner has an obscuration in the pupil. This has led to the choice to expand the aberration wave-front not in Zernikes anymore, but in other, orthogonal, basis-functions instead. The reasons for this choice and the description of the basis-functions will be discussed.

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Laurens de Winter, Timur Tudorovskiy, Jan van Schoot, Kars Troost, Erwin Stinstra, Stephen Hsu, Toralf Gruner, Juergen Mueller, Ruediger Mack, Bartosz Bilski, Joerg Zimmermann, and Paul Graeupner "High NA EUV scanner: obscuration and wavefront description", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 1151715 (18 November 2020); https://doi.org/10.1117/12.2572878

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