Thermal deformation of EUV mask according to mask type and pattern density

Chung-Hyun Ban; In-Hwa Kang; Beom-Jun Jeon; Won-young Choi; Hye-Keun Oh

doi:10.1117/12.2573149

20 September 2020 Thermal deformation of EUV mask according to mask type and pattern density

Chung-Hyun Ban, In-Hwa Kang, Beom-Jun Jeon, Won-young Choi, Hye-Keun Oh

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Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 115171C (2020) https://doi.org/10.1117/12.2573149
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

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Chung-Hyun Ban, In-Hwa Kang, Beom-Jun Jeon, Won-young Choi, and Hye-Keun Oh "Thermal deformation of EUV mask according to mask type and pattern density", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 115171C (20 September 2020); https://doi.org/10.1117/12.2573149

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