A presentation of current and future materials for the EUV photomask

Supriya L. Jaiswal

doi:10.1117/12.2573180

20 September 2020 A presentation of current and future materials for the EUV photomask

Supriya L. Jaiswal

Author Affiliations +

Proceedings Volume 11518, Photomask Technology 2020; 115180M (2020) https://doi.org/10.1117/12.2573180
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

Since the advent of EUV into high volume manufacturing at the 7 nm node, the role played by EUV materials in the photomask and optics for long term sustainability is considered. This presentation examines current and future choices for materials in the photomask and optics. More flexible high NA design, tolerance to defects, longer lifetimes, 3D shadow mask effect are factors which drive new choices in materials. Given the trade-offs required, new possibilities in materials are proposed which are holistically considered solutions to the challenges presented by next generation manufacturing.

Conference Presentation

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Supriya L. Jaiswal "A presentation of current and future materials for the EUV photomask", Proc. SPIE 11518, Photomask Technology 2020, 115180M (20 September 2020); https://doi.org/10.1117/12.2573180

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