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20 September 2020 A pattern transfer from semiconductors, and more: Nikon’s large-size photomask blanks for flat panel display
Takashi Yagami, Yohei Takarada, Kento Hayashi, Shigehiko Miyagi, Yusuke Taki, Takashi Ozawa
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Proceedings Volume 11518, Photomask Technology 2020; 115180T (2020) https://doi.org/10.1117/12.2575692
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only
Abstract
In this presentation we introduce photolithography for Flat Panel Display. The conventional problem for large-size photomask blanks is uniformity. For a large area, it is really difficult to improve substrate flatness and PSM transmittance/phase shifting angle uniformity. In this presentation we introduce our “Super Flat Mask (SFM) series” that have excellent flatness over G10 area. We also introduce our Att-Phase Shift film over G10 area. These films have uniform optical characteristics and nearly orthogonal cross section after etching. Along with very flat substrates, these films contribute well to production of high resolution panels.
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Takashi Yagami, Yohei Takarada, Kento Hayashi, Shigehiko Miyagi, Yusuke Taki, and Takashi Ozawa "A pattern transfer from semiconductors, and more: Nikon’s large-size photomask blanks for flat panel display", Proc. SPIE 11518, Photomask Technology 2020, 115180T (20 September 2020); https://doi.org/10.1117/12.2575692
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KEYWORDS
Photomasks
Semiconductors
Flat panel displays
Optical lithography
LCDs
Organic light emitting diodes
Dry etching
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