Hybrid E-beam lithography and process improvement for nanodevice fabrication

I. Servin Sr.; F. Laulagnet; M. Cannac; Ahmed Gharbi; J-A. Dallery

doi:10.1117/12.2572868

13 October 2020 Hybrid E-beam lithography and process improvement for nanodevice fabrication

I. Servin Sr., F. Laulagnet, M. Cannac, Ahmed Gharbi, J-A. Dallery

Author Affiliations +

Proceedings Volume 11518, Photomask Technology 2020; 115180U (2020) https://doi.org/10.1117/12.2572868
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

Maskless lithography is versatile and suitable for demonstrators covering a large field of applications for advanced devices. Hybrid lithography is a technique reducing significantly writing time by coupling an e-beam tool and a mask-based DUV optical tool. This novel approach involves two consecutive exposures using a unique e-beam resist following by a single development step, unlike complex “mix-and-match” multiple patterning strategies. Besides the matching of e-beam resist sensitivity to both e-beam/DUV exposures, we demonstrate high-resolution capability of CAR resists down to 30nm, while reducing writing time by a factor of 6 by using the hybrid approach. The overlay (OVL) performance between these 2 lithography steps and towards the previous levels meets also the alignment requirements and capabilities.

Conference Presentation

Citation Download Citation

I. Servin Sr., F. Laulagnet, M. Cannac, Ahmed Gharbi, and J-A. Dallery "Hybrid E-beam lithography and process improvement for nanodevice fabrication", Proc. SPIE 11518, Photomask Technology 2020, 115180U (13 October 2020); https://doi.org/10.1117/12.2572868

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