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22 February 2021 0.33 NA EUV systems for high-volume manufacturing
Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie Van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Klaus Hummler, Roderik Van Es
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Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 1160908 (2021) https://doi.org/10.1117/12.2583992
Event: SPIE Advanced Lithography, 2021, Online Only
Abstract
0.33 NA EUV scanners are being used for High Volume Manufacturing. In this paper we will give an update on the performance improvements of the NXE:3400 systems related to the lithographic performance, productivity and uptime. Finally we look at future system improvements to meet requirements for the 3 nm node and beyond.
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Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie Van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Klaus Hummler, and Roderik Van Es "0.33 NA EUV systems for high-volume manufacturing", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 1160908 (22 February 2021); https://doi.org/10.1117/12.2583992
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KEYWORDS
Extreme ultraviolet lithography
High volume manufacturing
Critical dimension metrology
Lithography
Logic
Overlay metrology
Scanners
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