Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations

Adam Lyons; Luke Long; Tom Wallow; Chris Spence; Ton Kiers; Paul van Adrichem; Vidya Vaenkatesan; Jiyou Fu; Christoph Hennerkes; Cyrus Tabery

doi:10.1117/12.2584744

26 February 2021 Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations

Adam Lyons, Luke Long, Tom Wallow, Chris Spence, Ton Kiers, Paul van Adrichem, Vidya Vaenkatesan, Jiyou Fu, Christoph Hennerkes, Cyrus Tabery

Author Affiliations +

Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 116090C (2021) https://doi.org/10.1117/12.2584744
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

In this submission we describe a framework to simulate mask variability in the form of CD distributions, edge placement error distributions and edge roughness. The impact of each method on wafer variability is then simulated. The results show that assumptions of mask edge placement correlation affect the match of simulated wafer variability to experiment, and that simulated mask contributions to wafer variability are not negligible. The authors demonstrate that for a DRAM use case, wafer level variability increases with scaling, but can be reduced with mask and wafer process improvement. For a curvilinear use case it is demonstrated that the contribution of mask roughness to wafer level variation can be large compared to typical process specs.

Conference Presentation

Citation Download Citation

Adam Lyons, Luke Long, Tom Wallow, Chris Spence, Ton Kiers, Paul van Adrichem, Vidya Vaenkatesan, Jiyou Fu, Christoph Hennerkes, and Cyrus Tabery "Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 116090C (26 February 2021); https://doi.org/10.1117/12.2584744

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available