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22 February 2021 Investigation of waveguide modes in EUV mask absorbers
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Abstract
We propose and prove an alternative view of patterns on the EUV mask absorber as waveguides. The geometrical similarities between waveguides and EUV mask after stripping out the multilayer is shown. The waveguiding effect inside the EUV mask absorber is demonstrated by comparing rigorous RCWA (rigorous coupled-wave analysis) to the waveguide analytical solution. Our investigations of the near field of EUV mask demonstrate that waveguide effects dominate transmission of light through openings in the absorber of EUV masks. This perspective of the EUV mask is not to provide a model that explains all phenomena in EUV imaging scenarios or to propose other absorber materials. Instead, the proposed waveguide perspective of EUV masks helps to understand the root causes of certain far field and imaging characteristics of EUV masks.
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© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hazem Mesilhy, Peter Evanschitzky, Gerardo Bottiglieri, Claire van Lare, Eelco van Setten, and Andreas Erdmann "Investigation of waveguide modes in EUV mask absorbers", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 116090E (22 February 2021); https://doi.org/10.1117/12.2587948
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