Lensless EUV mask inspection for anamorphic patterns

Iacopo Mochi; Hyun-Su Kim; Atoosa Dejkameh; Ricarda Nebling; Dimitrios Kazazis; Uldis Locans; Tao Shen; Yasin Ekinci

doi:10.1117/12.2584518

12 March 2021 Lensless EUV mask inspection for anamorphic patterns

Iacopo Mochi, Hyun-Su Kim, Atoosa Dejkameh, Ricarda Nebling, Dimitrios Kazazis, Uldis Locans, Tao Shen, Yasin Ekinci

Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 116090M (2021) https://doi.org/10.1117/12.2584518
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Anamorphic mask design is necessary to overcome the geometrical limitation imposed by the reflective geometry used in EUV lithography projection systems and will be used in high-NA EUVL scanners. In this study, we demonstrate the capability of anamorphic imaging using CDI. We created anamorphic EUV masks with programmed defects and inspected it with RESCAN, a lensless microscope dedicated to EUV mask inspection.

Conference Presentation

Citation Download Citation

Iacopo Mochi, Hyun-Su Kim, Atoosa Dejkameh, Ricarda Nebling, Dimitrios Kazazis, Uldis Locans, Tao Shen, and Yasin Ekinci "Lensless EUV mask inspection for anamorphic patterns", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 116090M (12 March 2021); https://doi.org/10.1117/12.2584518

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