Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes

Kazuki Azumagawa; Takahiro Kozawa

doi:10.1117/12.2583671

21 February 2021 Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes

Kazuki Azumagawa, Takahiro Kozawa

Author Affiliations +

Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 116090X (2021) https://doi.org/10.1117/12.2583671
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Chemically amplified resists have been used in the EUV lithography. The basic additive, called a quencher, has been added to the resist formula to control acid diffusion. In this study, the effects of photodecomposable quencher (PDQ) concentration on the chemical gradient (an indicator for LER) in chemically amplified EUV resist processes were investigated. The chemical gradients were simulated on the basis of the sensitization and reaction mechanisms for different half-pitchs, sensitivities, photoacid generator (PAG) concentrations, PDQ concentrations, and the effective reaction radii for deprotection. The simulation results analyzed using least square, lasso, Ridge, and elastic net regressions are discussed.

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Kazuki Azumagawa and Takahiro Kozawa "Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 116090X (21 February 2021); https://doi.org/10.1117/12.2583671

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